| 释义 |
- References
{{AFC submission|d|not|u=Pberger7|ns=118|decliner=AngusWOOF|declinets=20190212171935|ts=20190212164559}} {{AFC comment|1=Wikipedia is not linkedin, even for executives that have corporate profiles. AngusWOOF (bark • sniff) 17:19, 12 February 2019 (UTC)}}
Graduated from Ohio State University with a BS EE (1984), MSE (1986), and Ph.D. (1989). Developed Intel’s 90nm strained silicon technologyIntroduced High-k dielectric gates for MOSFETs at 45nm node7 Intel Achievement awards Elevated to IEEE Fellow and Intel Senior Fellow Former Director of Transistor Research and Nanotechnology, Intel References http://newsroom.intel.com/community/intel_newsroom/bios |