| 词条 | Tetrakis(trimethylsilyloxy)silane |
| 释义 |
| Verifiedfields = changed | Watchedfields = changed | verifiedrevid = 442989197 | ImageFile = Tetrakistrimethylsilyloxysilane.jpg | ImageFile_Ref = {{Chemboximage|correct|??}} | ImageSize1 = 190 | PIN = | SystematicName = | OtherNames = | Section1={{Chembox Identifiers | Abbreviations = TTMS | CASNo = 3555-47-3 | CASNo_Ref = | PubChem = | ChemSpiderID = | ChemSpiderID_Ref = | UNII = | UNII_Ref = | ChEBI_Ref = | ChEBI = | EINECS = | UNNumber = | MeSHName = | RTECS = | Beilstein = | SMILES = | StdInChI = | StdInChI_Ref = | InChI = | StdInChIKey = | StdInChIKey_Ref = | InChIKey = }} |Section2={{Chembox Properties | C = 12| H = 36| O = 4| Si = 5 | Appearance = Colourless liquid | Density = 0.87 g cm−3[1] | MeltingPtC = -60 | BoilingPtC = 103-106 | VaporPressure = 8.96 Pa (25°C) | Solubility = | RefractIndex = 1.389 }} |Section3={{Chembox Hazards | FlashPtC = 80 | EUClass = {{Hazchem Xi}} | MainHazards = | NFPA-H = | NFPA-F = | NFPA-R = | RPhrases = | SPhrases = | FlashPt = }} |Section8={{Chembox Related | OtherCompounds =Hexamethyldisiloxane Octamethylcyclotetrasiloxane}} }}Tetrakis(trimethylsilyloxy)silane (TTMS) is an organosilicon compound with the formula Si[OSi(CH3)3]4. This colourless liquid is used as a reagent in organic synthesis.[2] ApplicationTTMS can be used for thin film coating with a nanostructured silicon dioxide prepared by plasma-enhanced chemical vapor deposition (PECVD) at atmospheric pressure.[3] References1. ^{{cite web|title=Chemical Book|url=http://www.chemicalbook.com/ChemicalProductProperty_EN_CB5119530.htm}} 2. ^{{cite book|last1=Fleming|first1=I|title=Science of Synthesis: Houben-Weyl Methods of Molecular Transformations|date=2002|publisher=Georg Thieme Verlag|location=Stuttgart|isbn=3-13-112171-8|pages=1060}} 3. ^{{cite journal|last1=Schäfer|first1=J|last2=Hnilica|first2=J|last3=Sperka|first3=J|last4=Quade|first4=A|last5=Kudrle|first5=V|last6=Foest|first6=R|last7=Vodak|first7=J|last8=Zajickova|first8=L|title=Tetrakis(trimethylsilyloxy)silane for nanostructured SiO2-like films deposited by PECVD at atmospheric pressure|journal=Surface & Coatings Technology|date=2016|issue=295|pages=112–118|doi=10.1016/j.surfcoat.2015.09.047|url=http://authors.elsevier.com/a/1T18ywevVw1p3|accessdate=2015-10-10}} 2 : Siloxanes|Trimethylsilyl compounds |
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